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Characterisations of atmospheric pressure ejected plasma sources

  • Yong Hwan Kim
  • , Yoon Ho Choi
  • , Ji Hun Kim
  • , Jong Kyu Park
  • , Won Tae Ju
  • , Kwang Hyun Paek
  • , Yong Seok Hwang

Research output: Contribution to journalArticlepeer-review

Abstract

Atmospheric pressure ejected plasma sources have been developed for processing arbitrary shaped objects. Plasma sources with two coaxial electrodes are characterised experimentally by varying source design parameters such as discharge volume and discharge gap distance under various operating conditions such as RF power, gas flow rate, and gas compositions. Using optical emission spectroscopy (OES), gas temperatures and radical densities are qualitatively evaluated for flexible applications of the source. Discharge characteristics as glow has been confirmed with voltage and current (V-I) probes. Based on these source characteristics, specific design rules are presented for various applications such as polymer surface modification and metal surface decontamination.

Original languageEnglish (US)
Pages (from-to)535-540
Number of pages6
JournalSurface and Coatings Technology
Volume174-175
DOIs
StatePublished - 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Keywords

  • Atmospheric pressure ejected plasma
  • Gas temperature
  • OES
  • Radical density

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