Binding and diffusion of hydroxyl radicals on Si(100): A first-principles study

A. Vittadini, Annabella Selloni, M. Casarin

Research output: Contribution to journalArticle

31 Scopus citations

Abstract

We present a local density functional investigation of the adsorption geometry and the surface diffusion activation energies of hydroxyl (OH) radicals resulting from dissociative water adsorption on Si(100)-2×1. Similarly to atomic hydrogen, OH prefers to bind to a single surface silicon atom. Due to both dative interactions with surface dangling bonds, and to adsorbate-adsorbate hydrogen-bond-like interactions, the O-H bonds tend to be oriented perpendicularly to the dimer direction, in agreement with electron stimulated desorption ion angular distribution data. The energetics of OH diffusion, investigated both on a clean and on a saturated surface, is rather similar to that of hydrogen, with slightly lower barriers. In particular, the intradimer barrier is found to be ∼0.2 eV lower, which implies that room-temperature intradimer adsorbate oscillations should occur ∼103 times faster for OH. The absolute value of this barrier (0.9 eV) is in agreement with experimental scanning tunneling microscopy observations.

Original languageEnglish (US)
Pages (from-to)5885-5889
Number of pages5
JournalPhysical Review B
Volume52
Issue number8
DOIs
StatePublished - Jan 1 1995

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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