43 Scopus citations

Abstract

Current demands on optical nanolithography require the ability to rapidly and cost-effectively write arbitrary patterns over large areas with sub-diffraction limit feature sizes. The challenge in accomplishing this with arrays of near-field probes is maintaining equal separations between the substrate and each probe, even over non-planar substrates. Here we demonstrate array-based laser nanolithography where each probe is a microsphere capable of fabricating 100 nm structures using 355 nm light when self-positioned near a surface by Bessel beam optical trapping. We achieve both a feature size uniformity and relative positioning accuracy better than 15 nm, which agrees well with our model. Further improvements are possible using higher power and/or narrower Bessel beam optical traps.

Original languageEnglish (US)
Pages (from-to)3640-3650
Number of pages11
JournalOptics Express
Volume17
Issue number5
DOIs
StatePublished - Mar 2 2009

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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