An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching

Keyphrases

• Molecular Dynamics 100%
• Reactive Ion Etching 100%
• Force Field 100%
• Silicon Dioxide 100%
• Dynamic Force 100%
• Silica 75%
• Ar Ions 50%
• Physical Sputtering 50%
• Magnitude Difference 25%
• Molecular Dynamics Simulation 25%
• Motivation 25%
• Prediction Method 25%
• Si Substrate 25%
• Depth Profile 25%
• Classical Molecular Dynamics Simulations 25%
• Beam Experiment 25%
• Plasma-surface Interaction 25%
• Plasma Simulation 25%
• F Atoms 25%
• Si Ions 25%
• Surface Depth 25%

Engineering

• Computer Simulation 100%
• Dynamic Force 100%
• Si Substrate 50%
• Depth Profile 50%

Material Science

• Silicon Dioxide 100%
• Silicon 100%
• Reactive Ion Etching 100%