Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO 2 templates

Amir A. Yasseri; Shashank Sharma; Theodore I. Kamins; Qiangfei Xia; Stephen Y. Chou; R. Fabian W. Pease

doi:10.1063/1.2360920

Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO ₂ templates

Amir A. Yasseri, Shashank Sharma, Theodore I. Kamins, Qiangfei Xia, Stephen Y. Chou, R. Fabian W. Pease

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Alkylsiloxane self-assembled monolayers (SAMs) were formed on surface relief created by nanoimprinting and etching recesses into Si and Si O2. Rather than exhibiting the isolated domains seen on unpatterned surfaces after limited formation time, the SAM on nanoimprinted surfaces became continuous and uniform after only a short (∼5-10 min) reaction time. The hydrocarbon chains are densely packed and nearly vertically oriented. X-ray photoemission spectroscopy indicates complete hydrolysis and elimination of Cl from the octadecyltrichlorosilane precursor. The results suggest that the pattern edges enhance the nucleation rate, leading to the rapid coverage, and provide in-plane order within the SAM.

Original language	English (US)
Article number	153121
Journal	Applied Physics Letters
Volume	89
Issue number	15
DOIs	https://doi.org/10.1063/1.2360920
State	Published - 2006

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2360920

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@article{c022ce479be94c9fa42f18dc52eaeff6,

title = "Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO 2 templates",

abstract = "Alkylsiloxane self-assembled monolayers (SAMs) were formed on surface relief created by nanoimprinting and etching recesses into Si and Si O2. Rather than exhibiting the isolated domains seen on unpatterned surfaces after limited formation time, the SAM on nanoimprinted surfaces became continuous and uniform after only a short (∼5-10 min) reaction time. The hydrocarbon chains are densely packed and nearly vertically oriented. X-ray photoemission spectroscopy indicates complete hydrolysis and elimination of Cl from the octadecyltrichlorosilane precursor. The results suggest that the pattern edges enhance the nucleation rate, leading to the rapid coverage, and provide in-plane order within the SAM.",

author = "Yasseri, {Amir A.} and Shashank Sharma and Kamins, {Theodore I.} and Qiangfei Xia and Chou, {Stephen Y.} and Pease, {R. Fabian W.}",

note = "Funding Information: The authors thank R. Stanley Williams of Hewlett-Packard for useful discussions and Filip Crnogorac and Daniel Witte of Stanford University for their assistance in obtaining the NIL samples. This work was supported in part by the Defense Advanced Research Projects Agency (DARPA), the Office of Naval Research (ONR), and Hewlett-Packard. ",

year = "2006",

doi = "10.1063/1.2360920",

language = "English (US)",

volume = "89",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

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T1 - Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO 2 templates

AU - Yasseri, Amir A.

AU - Sharma, Shashank

AU - Kamins, Theodore I.

AU - Xia, Qiangfei

AU - Chou, Stephen Y.

AU - Pease, R. Fabian W.

N1 - Funding Information: The authors thank R. Stanley Williams of Hewlett-Packard for useful discussions and Filip Crnogorac and Daniel Witte of Stanford University for their assistance in obtaining the NIL samples. This work was supported in part by the Defense Advanced Research Projects Agency (DARPA), the Office of Naval Research (ONR), and Hewlett-Packard.

PY - 2006

Y1 - 2006

N2 - Alkylsiloxane self-assembled monolayers (SAMs) were formed on surface relief created by nanoimprinting and etching recesses into Si and Si O2. Rather than exhibiting the isolated domains seen on unpatterned surfaces after limited formation time, the SAM on nanoimprinted surfaces became continuous and uniform after only a short (∼5-10 min) reaction time. The hydrocarbon chains are densely packed and nearly vertically oriented. X-ray photoemission spectroscopy indicates complete hydrolysis and elimination of Cl from the octadecyltrichlorosilane precursor. The results suggest that the pattern edges enhance the nucleation rate, leading to the rapid coverage, and provide in-plane order within the SAM.

AB - Alkylsiloxane self-assembled monolayers (SAMs) were formed on surface relief created by nanoimprinting and etching recesses into Si and Si O2. Rather than exhibiting the isolated domains seen on unpatterned surfaces after limited formation time, the SAM on nanoimprinted surfaces became continuous and uniform after only a short (∼5-10 min) reaction time. The hydrocarbon chains are densely packed and nearly vertically oriented. X-ray photoemission spectroscopy indicates complete hydrolysis and elimination of Cl from the octadecyltrichlorosilane precursor. The results suggest that the pattern edges enhance the nucleation rate, leading to the rapid coverage, and provide in-plane order within the SAM.

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Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO ₂ templates

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