Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO 2 templates

Amir A. Yasseri, Shashank Sharma, Theodore I. Kamins, Qiangfei Xia, Stephen Y. Chou, R. Fabian W. Pease

Research output: Contribution to journalArticle

15 Scopus citations

Abstract

Alkylsiloxane self-assembled monolayers (SAMs) were formed on surface relief created by nanoimprinting and etching recesses into Si and Si O2. Rather than exhibiting the isolated domains seen on unpatterned surfaces after limited formation time, the SAM on nanoimprinted surfaces became continuous and uniform after only a short (∼5-10 min) reaction time. The hydrocarbon chains are densely packed and nearly vertically oriented. X-ray photoemission spectroscopy indicates complete hydrolysis and elimination of Cl from the octadecyltrichlorosilane precursor. The results suggest that the pattern edges enhance the nucleation rate, leading to the rapid coverage, and provide in-plane order within the SAM.

Original languageEnglish (US)
Article number153121
JournalApplied Physics Letters
Volume89
Issue number15
DOIs
StatePublished - Oct 20 2006

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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