Air cushion press for excellent uniformity, high yield, and fast nanoimprint across a 100 mm field

He Gao, Hua Tan, Wei Zhang, Keith Morton, Stephen Y. Chou

Research output: Contribution to journalArticle

74 Scopus citations

Abstract

Imprint pressure uniformity is crucial to the pattern uniformity and yield of nanoimprint lithography (NIL) and, hence, its applications. We studied a novel imprint method, air cushion press (ACP), in which the mold and substrate are pressed against each other by gas pressure rather than solid plates, and compared it with a common method, solid parallel-plate press (SPP). We found that (a) under normal imprinting conditions the measured pressure distribution across a 100-mm-diameter single imprint field in ACP is nearly an order of magnitude more uniform; (b) ACP is immune to any dust and topology variations on the backside of the mold or substrate; (c) when a dust particle is between the mold and substrate, ACP reduces the damage area by orders of magnitude; (d) ACP causes much less mold damage because of significantly less lateral shift between the mold and substrate; and (e) ACP has much smaller thermal mass and therefore significantly faster speed for thermal imprinting.

Original languageEnglish (US)
Pages (from-to)2438-2441
Number of pages4
JournalNano Letters
Volume6
Issue number11
DOIs
StatePublished - Nov 1 2006

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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