Ab initio-derived dynamics for F₂ reactions with partially fluorinated Si(100) surfaces: Translational activation as a possible etching tool

Engineering & Materials Science

• Etching 100%
• Chemical activation 83%
• Atoms 40%
• Molecules 37%
• Fluorine 32%
• Chemisorption 23%
• Scattering 21%
• Kinetic energy 16%
• Molecular beams 13%
• Angular distribution 12%
• Silicon 12%
• Data storage equipment 9%
• Molecular dynamics 8%
• Computer simulation 4%
• Temperature 3%

Physics & Astronomy

• activation 74%
• etching 70%
• reactivity 42%
• fluorine 25%
• molecules 22%
• atoms 21%
• chemisorption 18%
• kinetic energy 13%
• scattering 12%
• energy 12%
• simulation 9%
• neutral beams 9%
• silicon 9%
• molecular beams 8%
• surface temperature 8%
• angular distribution 7%
• disorders 6%
• molecular dynamics 6%
• products 5%
• excitation 4%

Chemical Compounds

• Etching 83%
• Surface 29%
• Dissociative Chemisorption 24%
• Fluorine Atom 22%
• Energy 19%
• Kinetic Energy 19%
• Simulation 16%
• Molecule 14%
• Multi-Step Reaction 11%
• Surface Temperature 11%
• Molecular Beam 10%
• Disorder 7%
• Molecular Dynamics 6%
• Reaction Yield 3%
• Application 2%