A study of simultaneous patterning and alignment of semiconductor nanorods via polymerization-induced phase separation

Jesse Greener, Tibert Hendrik Van Der Loop, Chantal Paquet, Gregory Scholes, Eugenia Kumacheva

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

We report simultaneous patterning and alignment of semiconductor nanorods (NRs) in nanorod - polymer films by using photolithographic polymerization- induced phase separation (PIPS). Exposure of the nanoparticle - monomer mixture to UV irradiation through a mask resulted in the site-specific photoinitiated polymerization of the monomer, which was followed with flow of the NRs from the areas rich in polymer to the areas rich in monomer. The orientation of NRs in the direction of flow was trapped in the polymerized films and characterized in polarization absorption experiments.

Original languageEnglish (US)
Pages (from-to)3173-3177
Number of pages5
JournalLangmuir
Volume25
Issue number5
DOIs
StatePublished - Mar 3 2009
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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