Abstract
A new two-dimensional subwavelength resonant grating (SRG) filter was fabricated using nanoimprint lithography (NIL). The characterization of SRG filters with 2D pillars was also presented. The device was fabricated by NIL on fused silica substrate which consisted of a layer of pillars on top of a waveguide. The plasma enhanced chemical vapor deposited (PECVD) silicon nitride was used as pillars and waveguides material. It was found that new SRG filter exhibited higher peak efficiency of 88% and smaller FWHM of 0.95 nm at two orthogonal polarizations.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 584-585 |
| Number of pages | 2 |
| Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
| Volume | 2 |
| State | Published - 2001 |
| Event | 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society - San Diego, CA, United States Duration: Nov 11 2001 → Nov 15 2001 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering