A new two-dimensional Subwavelength Resonant Grating filter fabricated by Nanoimprint Lithography

A. S.P. Chang, W. Wu, Stephen Y. Chou

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

A new two-dimensional subwavelength resonant grating (SRG) filter was fabricated using nanoimprint lithography (NIL). The characterization of SRG filters with 2D pillars was also presented. The device was fabricated by NIL on fused silica substrate which consisted of a layer of pillars on top of a waveguide. The plasma enhanced chemical vapor deposited (PECVD) silicon nitride was used as pillars and waveguides material. It was found that new SRG filter exhibited higher peak efficiency of 88% and smaller FWHM of 0.95 nm at two orthogonal polarizations.

Original languageEnglish (US)
Pages (from-to)584-585
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume2
StatePublished - Dec 1 2001
Event14th Annual Meeting of the IEEE Lasers and Electro-Optics Society - San Diego, CA, United States
Duration: Nov 11 2001Nov 15 2001

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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