A new method for predicting the lifetime of highly stable amorphous-silicon thin-film transistors from accelerated tests

T. Liu, S. Wagner, J. C. Sturm

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

We present a new method for predicting the lifetime of highly stable amorphous-silicon thin-film transistors (a-Si TFTs) from accelerated tests at elevated temperatures. The rate of DC saturation current drop can be accelerated by a factor of ∼104 when the test temperature is raised to 160°C. This ability is particularly significant for predicting the stability and lifetime of a-Si TFTs as analog drivers in active-matrix organic light emitting diode (AMOLED) displays.

Original languageEnglish (US)
Title of host publication2011 International Reliability Physics Symposium, IRPS 2011
Pages2E.3.1-2E.3.5
DOIs
StatePublished - 2011
Event49th International Reliability Physics Symposium, IRPS 2011 - Monterey, CA, United States
Duration: Apr 10 2011Apr 14 2011

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Other

Other49th International Reliability Physics Symposium, IRPS 2011
Country/TerritoryUnited States
CityMonterey, CA
Period4/10/114/14/11

All Science Journal Classification (ASJC) codes

  • General Engineering

Keywords

  • Accelerated lifetime tests
  • a-Si TFTs
  • current degradation
  • stability
  • stretched hyperbola

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