Abstract
Summary form only given. CMOS dual-modulus prescaler circuits built in very thin SIMOX films are discussed. They operate at 6.2 GHz, the highest speed ever reported for a digital CMOS circuit and 50% faster than control circuits built in bulk Si. The high speed is obtained by taking advantage of the intrinsic properties of the SOI structure combined with the symmetric CMOS technology that simultaneously optimizes the characteristics of both the p- and n-channel transistors.
Original language | English (US) |
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Pages | 139-140 |
Number of pages | 2 |
State | Published - 1989 |
Externally published | Yes |
Event | IEEE SOS/SOI Technology Conference 1989 - Stateline, NV, USA Duration: Oct 3 1989 → Oct 5 1989 |
Other
Other | IEEE SOS/SOI Technology Conference 1989 |
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City | Stateline, NV, USA |
Period | 10/3/89 → 10/5/89 |
All Science Journal Classification (ASJC) codes
- General Engineering