100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy

Li Wen-Di Li, Chao Wang, Stephen Y. Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A wafer-scale (~4 inch) 100 nm nano-checkerboard structure was fabricated. The fabrication combines multiple nanoimprint lithography, 3-D patterning and self-aligned etching. Transmission/reflection resonance at ~750 nm and Raman enhancement of ~ 4.5x106 were achieved.

Original languageEnglish (US)
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2010
StatePublished - Dec 1 2010
EventConference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States
Duration: May 16 2010May 21 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherConference on Lasers and Electro-Optics, CLEO 2010
CountryUnited States
CitySan Jose, CA
Period5/16/105/21/10

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Wen-Di Li, L., Wang, C., & Chou, S. Y. (2010). 100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy. In Conference on Lasers and Electro-Optics, CLEO 2010 (Optics InfoBase Conference Papers).