100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy

Wen Di Li, Chao Wang, Stephen Y. Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A wafer-scale (∼4 inch) 100 nm nano-checkerboard structure was fabricated. The fabrication combines multiple nanoimprint lithography, 3-D patterning and self-aligned etching. Transmission/reflection resonance at ∼750 nm and Raman enhancement of ∼ 4.5∼106 were achieved.

Original languageEnglish (US)
Title of host publicationLasers and Electro-Optics/Quantum Electronics and Laser Science Conference
Subtitle of host publication2010 Laser Science to Photonic Applications, CLEO/QELS 2010
PublisherAssociation for Computing Machinery
ISBN (Print)9781557528902
DOIs
StatePublished - 2010

Publication series

NameLasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Radiation

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    Li, W. D., Wang, C., & Chou, S. Y. (2010). 100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy. In Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010 [5500438] (Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010). Association for Computing Machinery. https://doi.org/10.1364/cleo.2010.cfb5