Abstract
Bipolar pulsed power supply is one of the key equipment in magnetron sputtering system. Based on the working principle and technical characteristics of magnetron sputtering, a bipolar pulsed power supply with output voltage of 0-800 V, pulse width of 20-200 μs, frequency of 0-60 Hz, maximum pulse current of 150 A was developed, and the experimental results for the power supply with the water resistance load and the plasma load were obtained. The charging to the energy storage capacitor in the bipolar pulsed power supply was controlled by the DSP control mode. Integrating FPGA, PLC and touch screen man-machine exchange system, the bipolar pulses were got. A large number of experimental demonstration shows that the power supply solves the problems of plasma load discharge et al., and the designed bipolar pulsed power supply achieves the desired sputtering effect and fulfills the requirements of the technical index.
| Translated title of the contribution | Design of bipolar pulsed magnetron sputtering power supply |
|---|---|
| Original language | Chinese (Traditional) |
| Article number | 045004 |
| Journal | Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams |
| Volume | 30 |
| Issue number | 4 |
| DOIs | |
| State | Published - Apr 1 2018 |
| Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
Keywords
- Bipolar pulse
- FPGA
- Plasma
- Pulse forming network
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