Material Science
Amorphous Silicon
10%
Birefringence
8%
Density
5%
Electronic Circuit
9%
Field Effect Transistor
9%
Film
17%
Fluidics
7%
Gallium Arsenide
19%
Liquid Crystal
9%
Lithography
100%
Magnetic Disk
8%
Metal Film
11%
Molecular Beam Epitaxy
6%
Nanocrystalline Material
20%
Nanofluidics
12%
Oxide Compound
5%
Polarizer
9%
Polymer Films
8%
Quantum Dot
11%
Quantum Well
5%
Reactive Ion Etching
11%
Self Assembled Monolayer
5%
Self Assembly
12%
Silicon
32%
Thin Films
7%
Transistor
24%
Waveguide
6%
Engineering
Cavity Length
7%
Cavity Surface
6%
Channel Length
5%
Electron Optical Lithography
15%
Emitting Laser
6%
External Cavity
6%
Feature Size
5%
Field-Effect Transistor
10%
Floating Gate
5%
Gallium Arsenide
14%
Grating Period
7%
High Aspect Ratio
7%
Imprint Lithography
6%
Lithography
11%
Low-Temperature
7%
Magnetic Force
6%
Metal-Oxide-Semiconductor Field-Effect Transistor
6%
Nanofabrication Process
7%
Nanofluidics
9%
Nanoimprint Lithography
34%
Nanometre
13%
Nanoscale
20%
Optical Element
5%
Photodetector
30%
Plasmonics
9%
Quantum Dot
9%
Resonant Tunneling
7%
Single Electron
8%
Size Effect
6%
Thin Films
5%
Transmissions
17%
Waveguide
7%
Keyphrases
Amorphous Silicon
5%
Extraordinary Optical Transmission
6%
Finger Spacing
5%
Grating
5%
Induced Self-assembly
6%
Metal-semiconductor-metal Photodetector
6%
MOSFET
5%
Nanofabrication
5%
Nanoimprint
6%
Nanoimprint Lithography
15%
Optical Communication Components
6%
Polarization Switching
6%
Resonant Grating Filter
5%
Silicon Quantum Dots (Si QDs)
7%
Single Electron
5%
Subwavelength
22%
Transmission Grating
6%
Vertical-cavity Surface-emitting Laser (VCSEL)
11%
