Material Science
Lithography
100%
Silicon
32%
Transistor
24%
Nanocrystalline Material
20%
Gallium Arsenide
19%
Film
17%
Nanofluidics
12%
Self Assembly
12%
Quantum Dot
11%
Reactive Ion Etching
11%
Metal Film
11%
Amorphous Silicon
10%
Liquid Crystal
9%
Field Effect Transistor
9%
Electronic Circuit
9%
Polarizer
9%
Polymer Films
8%
Birefringence
8%
Magnetic Disk
8%
Fluidics
7%
Thin Films
7%
Waveguide
6%
Molecular Beam Epitaxy
6%
Density
5%
Quantum Well
5%
Self Assembled Monolayer
5%
Oxide Compound
5%
Engineering
Nanoimprint Lithography
34%
Photodetector
30%
Nanoscale
20%
Transmissions
17%
Electron Optical Lithography
15%
Gallium Arsenide
14%
Nanometre
13%
Lithography
11%
Field-Effect Transistor
10%
Plasmonics
9%
Nanofluidics
9%
Quantum Dot
9%
Single Electron
8%
Resonant Tunneling
7%
Waveguide
7%
Nanofabrication Process
7%
High Aspect Ratio
7%
Grating Period
7%
Low-Temperature
7%
Cavity Length
7%
Emitting Laser
6%
Cavity Surface
6%
Size Effect
6%
Imprint Lithography
6%
Magnetic Force
6%
Metal-Oxide-Semiconductor Field-Effect Transistor
6%
External Cavity
6%
Channel Length
5%
Floating Gate
5%
Optical Element
5%
Feature Size
5%
Thin Films
5%
Keyphrases
Subwavelength
22%
Nanoimprint Lithography
15%
Vertical-cavity Surface-emitting Laser (VCSEL)
11%
Silicon Quantum Dots (Si QDs)
7%
Metal-semiconductor-metal Photodetector
6%
Nanoimprint
6%
Extraordinary Optical Transmission
6%
Polarization Switching
6%
Transmission Grating
6%
Optical Communication Components
6%
Induced Self-assembly
6%
Amorphous Silicon
5%
Resonant Grating Filter
5%
Grating
5%
Finger Spacing
5%
MOSFET
5%
Single Electron
5%
Nanofabrication
5%
